{"title":"JSR vs Trumpf: Lithography compared","url":"https://www.frontiertechintelligence.com/compare/jsr-vs-trumpf","comparison":"JSR ranks 34 on the AI Infra 100 with a score of 93; Trumpf ranks 36 with 93. The eight measures are level. JSR is based in Tokyo, Japan, Trumpf in Ditzingen, Germany. JSR is named in 2 signals and Trumpf in 4.","companies":[{"name":"JSR","url":"https://www.frontiertechintelligence.com/companies/jsr","city":"Tokyo","country":"Japan","stage":null,"founded":null,"last_round":null,"positioning":"The photoresist leader (used in about a third of the world's chips), the only supplier with both chemically amplified and metal-oxide EUV resist platforms (Inpria), taken private by the Japanese state fund JIC in 2024 as a chokepoint asset; building resist plants beside Samsung and, at TSMC's request, in Taiwan.","assessed_in":{"domain":"AI Core","list":"AI Infra 100","rank":34,"score":93,"tier":"member","scores":{"gate_ne":["technology","firepower"],"leverage":10,"position":10,"progress":8,"firepower":8,"commercial":10,"deployment":10,"production":8,"technology":10},"why":"JSR supplies semiconductor lithography materials, including photoresists and metal-oxide resists through JSR and Inpria. Its planned plants for TSMC and Samsung directly support advanced semiconductor fabrication.","segment":"Lithography","layer":"Semiconductor equipment, materials & critical inputs"},"signals_total":2,"facts_total":4},{"name":"Trumpf","url":"https://www.frontiertechintelligence.com/companies/trumpf","city":"Ditzingen","country":"Germany","stage":null,"founded":null,"last_round":null,"positioning":"TRUMPF sits at one of the most concentrated chokepoints in the registry. It builds the high-power CO2 laser amplifier that generates the tin plasma inside every ASML EUV source, developed in close cooperation with ASML and ZEISS; without it there is no EUV light, and ASML holds roughly 94 percent of the EUV equipment market. On 2025-10-23 ASML gave TRUMPF its Supplier Award in the Technology category for first light of a new EUV high-energy laser for ASML's next generation, a machine of more than 450,000 parts weighing over 20 tons, with series production from 2026 and first deliveries to ASML in 2026. Group context: preliminary FY2025/26 (to 2026-06-30) sales EUR 4.34 billion against EUR 4.33 billion, order intake EUR 4.5 billion against EUR 4.2 billion, ending three years of declining orders and two of falling revenue; the United States became the strongest single market at about EUR 760 million, up 16 percent. Commercial is 4 because EUV is a named segment inside a EUR 4.34 billion group with no EUV revenue disclosed. Folded into this row (a company carries one AI Core score) is TRUMPF Photonic Components, a business field rather than a company: it makes vertical-cavity surface-emitting lasers and photodiodes used in over two billion phones and in optical data transmission for AI and autonomous driving, and supplies 100 Gbps-per-channel VCSELs to Optomind, which reached 800 Gbps in a transceiver. Nothing dated was found for 2025 to 2026 specific to the VCSEL line, so that ","assessed_in":{"domain":"AI Core","list":"AI Infra 100","rank":36,"score":93,"tier":"member","scores":{"leverage":10,"position":10,"progress":8,"firepower":8,"commercial":10,"deployment":10,"production":8,"technology":10},"why":"TRUMPF supplies high-energy EUV laser systems to ASML for next-generation semiconductor lithography, following its established role providing CO2 laser amplifiers for ASML EUV systems.","segment":"Lithography","layer":"Semiconductor equipment, materials & critical inputs"},"signals_total":4,"facts_total":35}],"note":"Assessment by Frontier Tech Intelligence; facts and signals carry their sources."}