TRUMPF supplies high-energy EUV laser systems to ASML for next-generation semiconductor lithography, following its established role providing CO2 laser amplifiers for ASML EUV systems.
TRUMPF sits at one of the most concentrated chokepoints in the registry. It builds the high-power CO2 laser amplifier that generates the tin plasma inside every ASML EUV source, developed in close cooperation with ASML and ZEISS; without it there is no EUV light, and ASML holds roughly 94 percent of the EUV equipment market. On 2025-10-23 ASML gave TRUMPF its Supplier Award in the Technology category for first light of a new EUV high-energy laser for ASML's next generation, a machine of more than 450,000 parts weighing over 20 tons, with series production from 2026 and first deliveries to ASML in 2026. Group context: preliminary FY2025/26 (to 2026-06-30) sales EUR 4.34 billion against EUR 4.33 billion, order intake EUR 4.5 billion against EUR 4.2 billion, ending three years of declining orders and two of falling revenue; the United States became the strongest single market at about EUR 760 million, up 16 percent. Commercial is 4 because EUV is a named segment inside a EUR 4.34 billion group with no EUV revenue disclosed. Folded into this row (a company carries one AI Core score) is TRUMPF Photonic Components, a business field rather than a company: it makes vertical-cavity surface-emitting lasers and photodiodes used in over two billion phones and in optical data transmission for AI and autonomous driving, and supplies 100 Gbps-per-channel VCSELs to Optomind, which reached 800 Gbps in a transceiver. Nothing dated was found for 2025 to 2026 specific to the VCSEL line, so that
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TRUMPF supplies high-energy EUV laser systems to ASML for next-generation semiconductor lithography, following its established role providing CO2 laser amplifiers for ASML EUV systems. TRUMPF sits at one of the most concentrated chokepoints in the registry. It builds the high-power CO2 laser amplifier that generates the tin plasma inside every ASML EUV source, developed in close cooperation with ASML and ZEISS; without it there is no EUV light, and ASML holds roughly 94 percent of the EUV equipment market. On 2025-10-23 ASML gave TRUMPF its Supplier Award in the Technology categ
Trumpf ranks 36 of 100 on the AI Infra 100 (November 2026 edition) with a score of 93 out of 100, in Lithography (Semiconductor equipment, materials & critical inputs). Assessment by Frontier Tech Intelligence.
ASML (rank 3), JSR (rank 34).
Trumpf is based in Ditzingen, Baden-Württemberg, Germany.
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